Process Performance Prediction for Chemical Mechanical Planarization CMP by Integration of Nonlinear Bayesian Analysis and Statistical Modeling
IEEE Transactions on Semiconductor Manufacturing, Vol. 23, No. 2, Mayıs 2010, s. 316-327, ISSN: 0894-6507
KONG ZHENYU,ASİL OZTEKİN,BEYCA ÖMER FARUK,UPENDRA PHATAK,SATİSH BUKKAPATNAM,RANGA KOMANDURİ